Our standard thin-film silicon sputtering targets are available in monocrystalline silicon with dimensions up to 150mm with perforations and threads, angles, slots, and back faces that work with both legacies sputtering equipment and the latest process equipment such as large-area coatings for solar arrays Power or fuel cells and flip-chip applications.

We have the particularity of supplying silicon sputtering targets in any shape according to the customer’s request, e.g., rectangular, ring-shaped, or oval.

Research size targets are also manufactured in custom sizes. All targets are analyzed using the most proven techniques, including X-ray Fluorescence (XRF), Glow Discharge Mass.

Spectrometry (GDMS), and Inductively Coupled Plasma (ICP). We can also supply targets outside of this range, as well as any size rectangular, ring, or oval targets.

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